Analysis and modelling of plasma enhanced CVD reactors. I. Two-dimensional treatment of a-Si:H deposition
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference38 articles.
1. A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
2. Mass transfer analyses of the plasma deposition process
3. The Analysis of Plasma‐Enhanced Chemical Vapor Deposition of Silicon Films: A Comparison of Predictions with Measurements
4. A Model for the Kinetics of Plasma Polymerization
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