Analysis of intermediate pressure SiH4/He capacitively coupled plasma for deposition of an amorphous hydrogenated silicon film in consideration of thermal diffusion effects
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Published:2017-07-17
Issue:8
Volume:26
Page:085003
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ISSN:1361-6595
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Container-title:Plasma Sources Science and Technology
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language:
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Short-container-title:Plasma Sources Sci. Technol.
Author:
Kim Ho Jun,Lee Hae June
Subject
Condensed Matter Physics
Cited by
21 articles.
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