Influence of the applied field frequency on the characteristics of Ar and diffusion plasmas sustained at electron cyclotron resonance above multipolar magnetic field structures-Reference-Cited by-同舟云学术

Influence of the applied field frequency on the characteristics of Ar and diffusion plasmas sustained at electron cyclotron resonance above multipolar magnetic field structures

Published:1997-08-01 Issue:3 Volume:6 Page:386-393
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Lagarde T,Arnal Y,Pelletier J

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference15 articles.

1. Microwave multipolar plasmas excited by distributed electron cyclotron resonance: Concept and performance

2. Influence of the multipolar magnetic field configuration on the density of distributed electron cyclotron resonance plasmas

3. A Parametric Study of the Etching of Silicon in SF6Microwave Multipolar Plasmas: Interpretation of Etching Mechanisms

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