On the role of metastables in capacitively coupled oxygen discharges-Reference-Cited by-同舟云学术

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On the role of metastables in capacitively coupled oxygen discharges

Published:2015-06-01 Issue:3 Volume:24 Page:035016
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Gudmundsson J T,Lieberman M A

Funder

Icelandic Research Fund

Swedish Government Agency for Innovation Systems (VINNOVA)

Lam Research Corporation

Department of Energy Office of Fusion Energy Science

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/24/i=3/a=035016/pdf

Reference60 articles.

1. Oxygen plasma etching for resist stripping and multilayer lithography

2. Surface modification and ageing of PMMA polymer by oxygen plasma treatment

3. Effects of dc bias on the kinetics and electrical properties of silicon dioxide grown in an electron cyclotron resonance plasma

4. Rutile TiO 2 thin films grown by reactive high power impulse magnetron sputtering

5. Radio-Frequency Oxygen Plasma as a Sterilization Source

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