A non-invasive technique to determine ion fluxes and ion densities in reactive and non-reactive pulsed plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/22/i=4/a=045009/pdf
Reference42 articles.
1. Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher
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