Effects of plasma processing on the microstructural properties of silicon powders
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference26 articles.
1. Direct visual observation of powder dynamics in rf plasma‐assisted deposition
2. Measurements of particle size kinetics from nanometer to micrometer scale in a low‐pressure argon‐silane radio‐frequency discharge
3. Powder‐free plasma chemical vapor deposition of hydrogenated amorphous silicon with high rf power density using modulated rf discharge
4. Observation of growing kinetics of particles in a helium‐diluted silane rf plasma
5. Particle thermophoresis in low pressure glow discharges
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