Powder‐free plasma chemical vapor deposition of hydrogenated amorphous silicon with high rf power density using modulated rf discharge
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104087
Reference8 articles.
1. Effects of low‐frequency modulation on rf discharge chemical vapor deposition
2. Measurement of the SiH3Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy
3. Diffusion Coefficient and Reaction Rate Constant of the SiH3Radical in Silane Plasma
4. Investigation of the growth kinetics of glow‐discharge hydrogenated amorphous silicon using a radical separation technique
5. Absolute rate constants for the reaction of SiH with hydrogen, deuterium and silane
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