Use of neural network to model the deposition rate of PECVD-silicon nitride films
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference28 articles.
1. Low-temperature silicon nitride for thin-film electronics on polyimide foil substrates
2. Modeling refraction characteristics of silicon nitride film deposited in a SiH/sub 4/-NH/sub 3/-N/sub 2/ plasma using neural network
3. Properties of nitrogen doped silicon films deposited by low-pressure chemical vapor deposition from silane and ammonia
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