Energy distribution of bombarding ions in plasma etching of dielectrics
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference42 articles.
1. Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor
2. Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor
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4. Ion energetics in electron cyclotron resonance discharges
5. Ion bombardment energy distributions in a radio frequency induction plasma
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