Metastable CF and CF2molecules in CF4inductively-coupled plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference34 articles.
1. CF and CF2radical kinetics and transport in a pulsed CF4ICP
2. Optical and electrical diagnostics of fluorocarbon plasma etching processes
3. CFx radical production and loss in a CF4 reactive ion etching plasma: Fluorine rich conditions
4. CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization
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2. Nanoscale deposition of chemically functionalised films via plasma polymerisation;RSC Advances;2013
3. Analysis and Modeling of Gas-Phase Processes in a CHF3 /Ar Discharge;Plasma Processes and Polymers;2011-03-25
4. Transient and stable species kinetics in pulsed cc-rf CF4/H2plasmas and their relation to surface processes;Journal of Physics D: Applied Physics;2007-11-16
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