Plasma diagnostic approach for the low-temperature deposition of silicon quantum dots using dual frequency PECVD-Reference-Cited by-同舟云学术

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Plasma diagnostic approach for the low-temperature deposition of silicon quantum dots using dual frequency PECVD

Published:2016-09-02 Issue:39 Volume:49 Page:395203
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Sahu B B,Yin Y,Lee J S,Han Jeon G,Shiratani M

Funder

Ministry of Science, ICT and Future Planning (MSIP)

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/49/i=39/a=395203/pdf

Reference69 articles.

1. Photoluminescence from Silicon Quantum Dots in Si Quantum Dots/Amorphous SiC Superlattice

2. Si nanocrystal p-i-n diodes fabricated on quartz substrates for third generation solar cell applications

3. Coaxial silicon nanowires as solar cells and nanoelectronic power sources

4. Silicon nanowire solar cells

5. Silicon Nanowire-Based Solar Cells on Glass: Synthesis, Optical Properties, and Cell Parameters

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