Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical, computational and experimental analysis-Reference-Cited by-同舟云学术

Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical, computational and experimental analysis

Published:2017 Issue:7 Volume:19 Page:5591-5610
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Sahu Bibhuti Bhusan¹²³⁴⁵^ORCID,Han Jeon Geon¹²³⁴⁵,Kersten Holger⁶⁷⁸⁹

Affiliation:

1. Center for Advanced Plasma Surface Technology (CAPST)

2. NU-SKKU Joint Institute for Plasma Nano Materials

3. Department of Advanced Materials Science and Engineering

4. Sungkyunkwan University

5. Suwon 440-746

6. Institute of Experimental and Applied Physics

7. Christian-Albrechts-University Kiel

8. 19 D-24098 Kiel

9. Germany

Abstract

An advanced plasma process using plasma chemistry and energy control for engineering Si thin film growth and microstructure is demonstrated.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2017/CP/C6CP06003J

Reference83 articles.

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