Charge storage characteristics of high density Mo nanocrystal embedded in silicon oxide and silicon nitride-Reference-Cited by-同舟云学术

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Charge storage characteristics of high density Mo nanocrystal embedded in silicon oxide and silicon nitride

Published:2010-02-05 Issue:7 Volume:43 Page:075106
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Lin Chao-Cheng,Chang Ting-Chang,Tu Chun-Hao,Chen Shih-Ching,Hu Chih-Wei,Sze Simon M,Tseng Tseung-Yuen,Chen Sheng-Chi,Lin Jian-Yang

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Protein-Mediated Nanocrystal Assembly for Flash Memory Fabrication

2. Metallic nano-crystals for flash memories

3. Metal nanocrystal memories. I. Device design and fabrication

4. Novel dual-metal gate technology using Mo-MoSi/sub x/ combination

5. Modeling of retention characteristics for metal and semiconductor nanocrystal memories

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1. Improvement of memory characteristics by employing a charge trapping layer with combining bent and flat energy bands*;Chinese Physics B;2020-04-01

2. Improved memory characteristics for nonvolatile memory by using a double-potential well charge trapping layer;Applied Physics Express;2019-06-21

3. Improved charge trapping characteristics of multilayered Zr x Si1− x O2 films with a bidirectional terraced bandgap structure;Applied Physics Express;2018-09-18

4. Improved memory characteristics of charge trap memory by employing double layered ZrO2 nanocrystals and inserted Al2O3;Journal of Applied Physics;2016-07-28

5. Recharging dynamics of Al Nanoclusters in a GaAs matrix;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2012-07

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