A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering-Reference-Cited by-同舟云学术

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A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering

Published:2008-10-06 Issue:21 Volume:41 Page:215301
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Sarakinos K,Alami J,Dukwen J,Woerdenweber J,Wuttig M

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/41/i=21/a=215301/pdf

Reference34 articles.

1. A novel pulsed magnetron sputter technique utilizing very high target power densities

2. Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge

3. Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges

4. Ionized physical vapor deposition (IPVD): A review of technology and applications

5. Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

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1. Temporal evolution of spatial optical emission characteristics by inductively-coupled impulse sputtering (ICIS) using high power-burst 155kHz-ICP;Vacuum;2020-05

2. The experimental approach into the influence of external inductance on the discharge characteristic of HiPIMS;Journal of Theoretical and Applied Physics;2019-09-17

3. Comparison of microstructures and magnetic properties in FePt alloy films deposited by direct current magnetron sputtering and high power impulse magnetron sputtering;Journal of Alloys and Compounds;2019-09

4. Influence of peak current on substrate plasma sheath properties of Ti films deposited by high-power pulsed magnetron sputtering;International Journal of Modern Physics B;2019-01-30

5. Flexible hard TiAlSiN nanocomposite coatings deposited by modulated pulsed power magnetron sputtering with controllable peak power;Thin Solid Films;2019-01

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