Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering

Published:2008-01-11 Issue:3 Volume:41 Page:035203
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Li X Y,Depla D,Leroy W P,Haemers J,De Gryse R

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/41/i=3/a=035203/pdf

Reference10 articles.

1. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

2. An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti‐O2reactive sputtering processes

3. Fundamental understanding and modeling of reactive sputtering processes

4. Towards a more complete model for reactive magnetron sputtering

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering;Applied Surface Science;2023-03

2. Dynamics of reactive sputtering affecting phase formation of Co–N thin films;Applied Physics A;2019-07-22

3. The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films;Applied Surface Science;2018-05

4. Modeling target erosion during reactive sputtering;Applied Surface Science;2015-03

5. Magnetron sputter deposition as visualized by Monte Carlo modeling;Thin Solid Films;2012-08

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