A method of formation of thin oxide films on silicon in a microwave magnetoactive oxygen plasma-Reference-Cited by-同舟云学术

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A method of formation of thin oxide films on silicon in a microwave magnetoactive oxygen plasma

Published:1975-11-11 Issue:16 Volume:8 Page:L195-L197
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Bardos L,Loncar G,Stoll I,Musil J,Zacek F

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/8/i=16/a=002/pdf

Reference2 articles.

1. Silicon Oxidation in an Oxygen Plasma Excited by Microwaves

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