Electrical stability enhancement of GeInGaO thin-film transistors by solution-processed Li-doped yttrium oxide passivation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Electrical stability enhancement of GeInGaO thin-film transistors by solution-processed Li-doped yttrium oxide passivation

Published:2016-06-15 Issue:28 Volume:49 Page:285103
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Choi U H,Yoon S,Yoon D H,Tak Y J,Kim Y-G,Ahn B D,Park J,Kim H J

Funder

National Research Foundation of Korea

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/49/i=28/a=285103/pdf

Reference32 articles.

1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

2. Recent advances in low-temperature solution-processed oxide backplanes

3. Low-temperature formation of source–drain contacts in self-aligned amorphous oxide thin-film transistors

4. Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A selectively processible instant glue passivation layer for indium gallium zinc oxide thin-film transistors fabricated at low temperature;Journal of Materials Chemistry C;2018

2. Low-temperature fabrication of an HfO2 passivation layer for amorphous indium–gallium–zinc oxide thin film transistors using a solution process;Scientific Reports;2017-11-24

3. Towards environmentally stable solution-processed oxide thin-film transistors: a rare-metal-free oxide-based semiconductor/insulator heterostructure and chemically stable multi-stacking;Journal of Materials Chemistry C;2017

4. Low-temperature, inkjet printed p-type copper(i) iodide thin film transistors;Journal of Materials Chemistry C;2016

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3