Large diameter microwave SF6plasma production with ring-shaped permanent magnets
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/28/i=9/a=013/pdf
Reference12 articles.
1. Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma
2. 8” Uniform Electron Cyclotron Resonance Plasma Source Using a Circular TE01Mode Microwave
3. The application of the helicon source to plasma processing
4. NONRESONANT ABSORPTION OF ELECTROMAGNETIC WAVES IN A HIGH‐DENSITY PLASMA
5. Microwave multipolar plasmas excited by distributed electron cyclotron resonance: Concept and performance
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1. Langmuir probe measurements in inductively coupled CF4 plasmas;Surface and Coatings Technology;2006-03
2. Energy distribution functions of ions impinging on substrate in microwave plasma;Journal of Physics D: Applied Physics;2004-01-16
3. Characteristics of two-electron-temperature in inductively coupled CF4 plasmas;Acta Physica Sinica;2004
4. Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma;Japanese Journal of Applied Physics;2003-12-10
5. Planar microwave discharges with active control of plasma uniformity;Physics of Plasmas;2002-03
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