Pressure dependence of the nitrogen atom recombination probability in late afterglows
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/43/i=18/a=185203/pdf
Reference30 articles.
1. Kinetic modeling of low-pressure nitrogen discharges and post-discharges
2. Kinetics of atoms, metastable, radiative and ionic species in the nitrogen pink afterglow
3. Analysis of the growth of concomitant nitride layers produced by a post-discharge assisted process
4. Modelling nitrogen atom flux in post-discharge nitriding processes
5. Effects of N2post-discharge plasma treatments on wool fabrics
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