High H-atom Density in R(He,Ar)/x%(N2–5%H2) Early Afterglows-Reference-Cited by-同舟云学术

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High H-atom Density in R(He,Ar)/x%(N2–5%H2) Early Afterglows

Published:2020-06-05 Issue:5 Volume:40 Page:1351-1363
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Ricard André,Amorim Jayr,Abdeladim Mustapha,Sarrette Jean- Philippe

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

https://link.springer.com/content/pdf/10.1007/s11090-020-10092-0.pdf

Reference14 articles.

1. Wang Y, Ricard A, Sarrette JP, Kim A, Kim YK (2017) Surf Coat Technol 324:243

2. Ryu S, Wang Y, Ricard A, Sarrette JP, Kim A, Kim YK (2019) Surf Coat Technol 364:341

3. Zerrouki H, Ricard A, Sarrette JP (2013) Contrib Plasma Phys 53:599

4. Zerrouki H, Ricard A, Sarrette JP (2014) Contrib Plasma Phys 54:827

5. Zerrouki H, Ricard A, Sarrette JP (2014) J Phys: Conf Series 550:012045

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Kinetic mechanisms and species densities in N2/(0–5%)H2 afterglows;Chemical Physics Letters;2024-03

2. Comparative Study of Influence of Experimental Configuration on Densities of Active Species in the Early Afterglows of N2/(0–2.5%)H2 HF Flowing Plasmas;Plasma Chemistry and Plasma Processing;2022-07-16

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