Densities of Active Species in R/x%(N2–5%H2) (R = Ar or He) Microwave Flowing Afterglows-Reference-Cited by-同舟云学术

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Densities of Active Species in R/x%(N2–5%H2) (R = Ar or He) Microwave Flowing Afterglows

Published:2019-04-24 Issue:4 Volume:39 Page:1103-1114
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Ricard A.,Sarrette J. P.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-019-09992-7.pdf

Reference24 articles.

1. Villeger S, Sarrette JP, Ricard A (2005) Plasma Process Polym 2:709

2. Villeger S, Sarrette JP, Rouffet B, Cousty S, Ricard A (2008) Eur Phys J Appl Phys 42:25

3. Ryu S, Wang Y, Ricard A, Sarrette JP, Kim A, Kim A, Kim YK (2019) Accepted Surf Coat Technol

4. Wang Y, Ricard A, Sarrette JP, Kim A, Kim YK (2017) Surf Coat Technol 324:243

5. Ferreira JA, Nguyen HTP, Mi Z, Leonelli R, Stafford L (2014) Nanotechnology 25:435606

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparative Study of Influence of Experimental Configuration on Densities of Active Species in the Early Afterglows of N2/(0–2.5%)H2 HF Flowing Plasmas;Plasma Chemistry and Plasma Processing;2022-07-16

2. High H-atom Density in R(He,Ar)/x%(N2–5%H2) Early Afterglows;Plasma Chemistry and Plasma Processing;2020-06-05

3. The Pulsed Periodic Discharge in Mixtures of Ar with Sulfur Vapour;Plasma Chemistry and Plasma Processing;2020-02-06

4. Correction to: Densities of Active Species in R/x%(N2–5%H2) (R = Ar or He) Microwave Flowing Afterglows;Plasma Chemistry and Plasma Processing;2019-07-17

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