Synthesis characteristics of Cu particulates in high-pressure magnetron sputtering plasmas studied byin situlaser-light scattering
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference31 articles.
1. Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering
2. Two-Dimensional Distributions of Ti and Ti+Densities in High-Pressure Magnetron Sputtering Discharges
3. Investigations of Production Processes of Ti+in High-Pressure Magnetron Sputtering Plasmas
4. Multilevel Aluminum Dual-Damascene Interconnects for Process-Step Reduction in 0.18 µm ULSIs
5. Magnetron sputter deposition with high levels of metal ionization
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3. Diagnostics of a high-pressure DC magnetron argon discharge with an aluminium cathode;The European Physical Journal D;2021-09
4. Effect of growing nanoparticle on the magnetic field induced filaments in a radio-frequency Ar/C2H2 discharge plasma;Japanese Journal of Applied Physics;2020-03-05
5. Thermal balance of tungsten monocrystalline nanoparticles in high pressure magnetron discharges;Physics of Plasmas;2019-05
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