Investigations of Production Processes of Ti+in High-Pressure Magnetron Sputtering Plasmas
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference33 articles.
1. Ionized physical vapor deposition of integrated circuit interconnects
2. Sputter deposition for semiconductor manufacturing
3. Directional and preferential sputtering-based physical vapor deposition
4. Fundamental characteristics of built‐in high‐frequency coil‐type sputtering apparatus
5. Simulations of trench-filling profiles under ionized magnetron sputter metal deposition
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2. Plasma diagnostic by optical emission spectroscopy on reactive magnetron sputtering plasma –A Brief Introduction;Journal of Physics: Conference Series;2018-05
3. Comparison between absolute densities of metastable state and ground state of atoms in CZTS sputtering plasmas;AIP Conference Proceedings;2017
4. Are the argon metastables important in high power impulse magnetron sputtering discharges?;Physics of Plasmas;2015-11
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