Density of N2(X1Σg+;v= 18) molecules in a dc glow discharge measured by cavity ringdown spectroscopy at 227 nm; validity domain of the technique
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/34/i=12/a=307/pdf
Reference44 articles.
1. Low temperature plasma deposition of silicon nitride from silane and nitrogen plasmas
2. Effects of helicon-wave excited N2 plasma treatment on Fermi-level pinning in GaAs
3. Far cold remote nitrogen plasma for surface modification and film deposition
4. On the axial structure of a nitrogen surface wave sustained discharge: Theory and experiment
5. Vibrational Relaxation of Anharmonic Oscillators with Exchange‐Dominated Collisions
Cited by 40 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Comparison among translational temperatures of He(1P1o) , He(3S1) , and Ar(4s[3/2]2o) in inductively coupled plasmas;Japanese Journal of Applied Physics;2021-06-01
2. Effect of discharge tube temperature on ${{\rm{N}}}_{2}({A}^{3}{{\rm{\Sigma }}}_{u}^{+})$ and ${\rm{N}}{(}^{4}{S}^{{\rm{o}}})$ densities in remote nitrogen plasma;Japanese Journal of Applied Physics;2020-08-25
3. Power Pulsing To Maximize Vibrational Excitation Efficiency in N2 Microwave Plasma: A Combined Experimental and Computational Study;The Journal of Physical Chemistry C;2019-09-23
4. Modelling N2–O2 plasmas: volume and surface kinetics;Plasma Sources Science and Technology;2019-07-25
5. Local fractality: The case of forest fires in Portugal;Physica A: Statistical Mechanics and its Applications;2017-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3