A molecular dynamics study of H radical bombardment of CH3 : Si(1 0 0)— comparison of simulation and experiment
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/42/i=22/a=222001/pdf
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5. Molecular Dynamics Simulations of the Chemical Modification of Polystyrene through CxFy+ Beam Deposition
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1. Modification mechanisms of silicon thin films in low-temperature hydrogen plasmas;Journal of Physics D: Applied Physics;2018-11-28
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