Direct measurement of contamination and etching rates in an electron beam
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/9/i=4/a=016/pdf
Reference16 articles.
1. Inelastic scattering of 80 keV electrons in amorphous carbon
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