Effect of Low-frequency Power on F, CF2Relative Density and F/CF2Ratio in Fluorocarbon Dual-Frequency Plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference22 articles.
1. Low-k dielectric materials
2. Low dielectric constant materials for microelectronics
3. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices
4. Prediction of organic low-kmaterial etching in two frequency capacitively coupled plasma
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