Prediction of organic low-kmaterial etching in two frequency capacitively coupled plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Nuclear Energy and Engineering
Link
http://stacks.iop.org/0741-3335/48/i=12B/a=S10/pdf
Reference20 articles.
1. Low dielectric constant materials for microelectronics
2. High-density plasma patterning of low dielectric constant polymers: A comparison between polytetrafluoroethylene, parylene-N, and poly(arylene ether)
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