The role of hydrogen in hydrogenated microcrystalline silicon film and in deposition process with VHF-PECVD technique
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/1009-1963/15/6/041/pdf
Reference28 articles.
1. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?
2. Photovoltaic Technology: The Case for Thin-Film Solar Cells
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4. Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon
5. Substrate bias effects on low temperature polycrystalline silicon formation using electron cyclotron resonance SiH4/H2 plasma
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1. Local Site Distribution of Oxygen in Silicon-Rich Oxide Thin Films: A Tool to Investigate Phase Separation;The Journal of Physical Chemistry C;2012-04-25
2. Electron mobility of strained Si/(001)Si1- x Ge x;Acta Physica Sinica;2011
3. The high deposition of microcrystalline silicon thin film by very high frequency plasma enhanced chemical vapour deposition and the fabrication of solar cells;Chinese Physics B;2008-09
4. Determination of conduction band edge characteristics of strained Si/Si 1- x Ge x;Chinese Physics;2007-12
5. Role of gas residence time in the deposition rate and properties of microcrystalline silicon films;Acta Physica Sinica;2007
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