Large area VUV source for thin film processing
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics
Link
http://stacks.iop.org/1402-4896/41/i=1/a=006/pdf
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1. Disk hydrogen plasma assisted chemical vapor deposition of aluminum nitride
2. Laser microphotochemistry for use in solid-state electronics
3. Aluminum-Nitrogen Polymers by Condensation Reactions1
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1. Hydrogen Lyman-alpha and Lyman-beta emissions from high-pressure microhollow cathode discharges in Ne-H2mixtures;Journal of Physics B: Atomic, Molecular and Optical Physics;1999-11-08
2. Industrial processing of polymers by low-pressure plasmas: the role of VUV radiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1999-05
3. Lyman-alpha emission via resonant energy transfer;Journal of Physics B: Atomic, Molecular and Optical Physics;1998-10-28
4. Synchrotron‐Radiation‐Excited Etching of Silicon Wafer Enhanced by Disk‐Shaped CF 4 Plasma;Journal of The Electrochemical Society;1996-12-01
5. Synchrotron-Radiation-Induced Deposition of Etch-Protecting Film on Si inCF4Plasma;Japanese Journal of Applied Physics;1996-02-15
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