Measurement of picometre non-linearity in an optical grating encoder using x-ray interferometry
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference16 articles.
1. Combined optical and X–ray interferometry for high–precision dimensional metrology
2. The use of x-ray interferometry to investigate the linearity of the NPL Differential Plane Mirror Optical Interferometer
3. Recent advances in displacement measuring interferometry
4. A review of recent work in sub-nanometre displacement measurement using optical and X–ray interferometry
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