Characterizing a scatterfield optical platform for semiconductor metrology
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference16 articles.
1. Metrology of subwavelength photoresist gratings using optical scatterometry
2. Ellipsometric scatterometry for the metrology of sub-01-μm-linewidth structures
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5. Fundamental limits of optical critical dimension metrology: a simulation study
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