Closed-form breakdown voltage/specific on-resistance model using charge superposition technique for vertical power double-diffused metal–oxide–semiconductor device with high- κ insulator
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/1674-1056/27/4/048502/pdf
Reference21 articles.
1. A Vertical Power MOSFET With an Interdigitated Drift Region Using High- $k$ Insulator
2. Vertical Power ${\rm H}k$-MOSFET of Hexagonal Layout
3. Study on H K -VDMOS with Deep Trench Termination
4. Effect of the trench shape on the electrical properties of silicon based trench barrier schottky diode
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1. Performance enhancement of 4H-SiC superjunction trench MOSFET with extended high-K dielectric;Microelectronics Journal;2024-09
2. Modeling of high permittivity insulator structure with interface charge by charge compensation;Chinese Physics B;2021-02-01
3. Research on the Negative Resistance Characteristics of Silicon-based Trench MOS Barrier Schottky Diodes;Journal of Physics: Conference Series;2020-11-01
4. 600-V shielded trench split-gate VDMOS improving the figure of merit;International Journal of Electronics;2019-11-20
5. Modeling Power Vertical High-k MOS Device With Interface Charges via Superposition Methodology-Breakdown Voltage and Specific ON-Resistance;IEEE Transactions on Electron Devices;2018-11
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