Effects of secondary electron emission on plasma density and electron excitation dynamics in dual-frequency asymmetric capacitively coupled argon plasmas-Reference-Cited by-同舟云学术

Effects of secondary electron emission on plasma density and electron excitation dynamics in dual-frequency asymmetric capacitively coupled argon plasmas

Published:2018-06-25 Issue:6 Volume:27 Page:064004
ISSN:1361-6595
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Liu Gang-Hu,Wang Xiang-Yu,Liu Yong-Xin,Sun Jing-Yu,Wang You-Nian^ORCID

Funder

Important National Science and Technology Specific Project

National Natural Science Foundation of China

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://iopscience.iop.org/article/10.1088/1361-6595/aaca8c/pdf

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3. Plasma etching: Yesterday, today, and tomorrow

4. Dual excitation reactive ion etcher for low energy plasma processing

5. Independent control of ion density and ion bombardment energy in a dual RF excitation plasma

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