Ion composition of rf CCP in Ar/H2 mixtures
Author:
Funder
Russian Foundation for Basic Research
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/ab3acc/pdf
Reference61 articles.
1. Ar + H2 plasma etching for improved adhesion of PVD coatings on steel substrates
2. Effect of O2, Ar/H2and CF4plasma treatments on the structural and dielectric properties of parylene-C thin films
3. Towards a general concept of diamond chemical vapour deposition
4. Detection of a Noble Gas Molecular Ion, 36 ArH + , in the Crab Nebula
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