Emission spectra of argon and hydrogen excited by pulses with durations of 0.7 and 160 ns in an inhomogeneous electric field

Author:

Feng Bowen,Panchenko A N,Zhang ChengORCID,Tarasenko V FORCID,Zhang ChuanshengORCID,Sorokin D AORCID,Kozevnikov V V,Shao TaoORCID

Abstract

Abstract In this paper, the radiation of argon and hydrogen in a repetitively pulsed diffuse discharge formed in an inhomogeneous electric field at elevated gas pressure have been studied. The emission spectra are measured under a series of short voltage pulses with the durations of 0.7 ns and 160 ns. It is shown that for the diffuse discharge in pure argon, the transition of argon dimers (Ar2*, λ max = 126 nm) have the highest intensity. Small addition of Xe to Ar contributes to the disappearance of Ar2* radiation bands and the appearance of those of ArXe* and Xe2* dimers in the plasma emission spectrum. In hydrogen, emission at the maximum wavelength of 160 nm is dominated in the spectra of the diffuse discharge and the luminescence intensity in the region of 220–280 nm is relatively low. If Ar is added to H2, the diffuse discharge behaves non-uniform. The luminescence band with the peak at 160 nm narrows, strong argon ion line (Ar+, λ max = 191 nm) appears in the spectra, and the luminescence in the spectral region 220–280 nm reappears. The excitation temperature and electron density are diagnosed using emission spectra and images of the discharge plasma. It is shown that both of the excitation temperature and electron density increase as the electric field is enhanced, while the excitation temperature decreases as the gas pressure increases.

Funder

National Key Research and Development Plan of China

Ministry of Science and Higher Education

National Natural Science Foundation of China

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Long pulse UV and VUV gas discharge lasers;XVI International Conference on Pulsed Lasers and Laser Applications;2023-11-02

2. VUV lasers pumped by diffuse discharges;Applied Physics B;2023-10-24

3. VUV lasing in diffuse discharges formed by runaway electrons;Laser Physics;2023-09-12

4. Generation and measurement of low-temperature plasma for cancer therapy: a historical review;Free Radical Research;2023-03-04

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3