Elastic scattering of low-energy electrons by NF3
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics
Reference27 articles.
1. High density plasma oxide etching using nitrogen trifluoride and acetylene
2. Thermal stability and etching characteristics of electron beam deposited SiO and SiO[sub 2]
3. Gas utilization in remote plasma cleaning and stripping applications
4. Ab initio calculations to the reactions of CFm (m = 4−1) and NFn (n = 3−1) species with models of SiO2 surface structures
5. Study of the NF3 plasma cleaning of reactors for amorphous silicon deposition
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1. Electron interaction with NF x ( x = 1–3);Molecular Physics;2024-07-10
2. Plasma-relevant fast electron impact study of nitrogen trifluoride;Plasma Sources Science and Technology;2020-08-12
3. Computation of electron impact scattering studies on benzene;The European Physical Journal D;2018-12
4. Cross Sections for Electron Collisions with NF3;Journal of Physical and Chemical Reference Data;2017-12
5. Calculated cross sections for electron collisions with NF3, NF2and NF with applications to remote plasma sources;Plasma Sources Science and Technology;2017-05-09
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