Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
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Published:2018-01-23
Issue:3
Volume:20
Page:035507
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ISSN:1009-0630
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Container-title:Plasma Science and Technology
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language:
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Short-container-title:Plasma Sci. Technol.
Author:
XIONG YuqingORCID,
GAO Hengjiao,
REN Ni,
LIU Zhongwei
Subject
Condensed Matter Physics
Cited by
2 articles.
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