Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputtering
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Published:2020-01-13
Issue:3
Volume:22
Page:034010
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ISSN:1009-0630
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Container-title:Plasma Science and Technology
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language:
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Short-container-title:Plasma Sci. Technol.
Author:
WANG HanghangORCID,
ZHANG Liyan,
LU Wenqi,
XU Jun
Subject
Condensed Matter Physics
Cited by
2 articles.
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