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Diamond nanoimprint lithography

Published:2002-09-06 Issue:5 Volume:13 Page:592-596
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Taniguchi Jun,Tokano Yuji,Miyamoto Iwao,Komuro Masanori,Hiroshima Hiroshi

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/13/i=5/a=309/pdf

Reference6 articles.

1. Effects of resist thickness and thin-film interference in I-line and deep ultraviolet optical lithography

2. EL-4, a new generation electron-beam lithography system

3. Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm

4. Imprint of sub‐25 nm vias and trenches in polymers

5. Nanoimprint lithography

Cited by 61 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of mold shape mold vibration and substrate composition in FeNiCrCoMn high entropy alloys nanoimprint;Materials Today Communications;2022-08

2. Phase transformation and microstructure evolution of nanoimprinted NiCoCr medium entropy alloys;Journal of Alloys and Compounds;2022-02

3. Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features;ACS Nano;2021-06-11

4. Non-Absorbing Dielectric Materials for Surface-Enhanced Spectroscopies and Chiral Sensing in the UV;Nanomaterials;2020-10-21

5. Residual stress and elastic recovery of imprinted Cu-Zr metallic glass films using molecular dynamic simulation;Computational Materials Science;2019-12

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