Nanolithography made from water-based spin-coatable LSMO resist-Reference-Cited by-同舟云学术

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Nanolithography made from water-based spin-coatable LSMO resist

Published:2006-08-14 Issue:17 Volume:17 Page:4399-4404
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Chuang Chih-Min,Wu Ming-Chung,Huang Yu-Ching,Cheng Kuo-Chung,Lin Ching-Fu,Chen Yang-Fang,Su Wei-Fang

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/17/i=17/a=019/pdf

Reference33 articles.

1. Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam

2. Sub-10 nm Electron Beam Nanolithography Using Spin-Coatable TiO2 Resists

3. Direct writing of ZrO2on a sub-10 nm scale using an electron beam

4. Patterning and switching of nano-size ferroelectric memory cells

5. Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist

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4. Fluidic Flow Assisted Deterministic Folding of Van der Waals Materials;Advanced Functional Materials;2020-02-14

5. Ionic liquids—a novel material for planar photonics;Nanotechnology;2018-09-27

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