A combined etching process toward robust superhydrophobic SiC surfaces-Reference-Cited by-同舟云学术

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A combined etching process toward robust superhydrophobic SiC surfaces

Published:2012-05-31 Issue:25 Volume:23 Page:255703
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Liu Yan,Lin Wei,Lin Ziyin,Xiu Yonghao,Wong C P

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/23/i=25/a=255703/pdf

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors;Nanoscale;2024

2. Laser Textured Superhydrophobic SiC Ceramic Surface and the Performance of Condensation Heat Transfer;Crystals;2023-05-19

3. The evaluation of prepared microstructure pattern by carbon-dioxide laser on zirconia-based ceramics for dental implant application: an in vitro study;Odontology;2022-12-22

4. Anisotropic Charge Transport Enabling High‐Throughput and High‐Aspect‐Ratio Wet Etching of Silicon Carbide;Small Methods;2022-05-26

5. A robust, hydrophobic CeO2/NiCoCrAlY composite coating with excellent thermal stability and corrosion resistance prepared by air plasma spray;Journal of Alloys and Compounds;2021-04

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