Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices-Reference-Cited by-同舟云学术

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Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices

Published:2010-10-05 Issue:44 Volume:21 Page:445301
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Peroz C,Dhuey S,Volger M,Wu Y,Olynick D,Cabrini S

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/21/i=44/a=445301/pdf

Reference20 articles.

1. Imprint Lithography with 25-Nanometer Resolution

2. Nanoimprint Lithography on Silica Sol-Gels: A Simple Route to Sequential Patterning

3. Mold-assisted nanolithography: A process for reliable pattern replication

4. Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography

5. Nanofabrication with step and flash imprint lithography

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5. Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere;Journal of Photopolymer Science and Technology;2018-06-25

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