Full-wafer fabrication by nanostencil lithography of micro/nanomechanical mass sensors monolithically integrated with CMOS-Reference-Cited by-同舟云学术

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Full-wafer fabrication by nanostencil lithography of micro/nanomechanical mass sensors monolithically integrated with CMOS

Published:2008-06-16 Issue:30 Volume:19 Page:305302
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Arcamone J,van den Boogaart M A F,Serra-Graells F,Fraxedas J,Brugger J,Pérez-Murano F

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/19/i=30/a=305302/pdf

Reference37 articles.

1. Nanoelectromechanical systems

2. Ultra-sensitive NEMS-based cantilevers for sensing, scanned probe and very high-frequency applications

3. Zeptogram-Scale Nanomechanical Mass Sensing

4. MEMS technology for timing and frequency control

5. Resistless patterning of sub-micron structures by evaporation through nanostencils

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