Electrical, Structural and Interfacial Characterization of HfO 2 Films on Si Substrates
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/28/8/086803/pdf
Reference19 articles.
1. High dielectric constant oxides
2. Influence of Radio-Frequecy Power on Structural and Electrical Properties of Sputtered Hafnium Dioxide Thin Films
3. Electrical Characterization of Metal–Insulator–Metal Capacitors with Atomic-Layer-Deposited HfO 2 Dielectrics for Radio Frequency Integrated Circuit Application
4. Frequency dependent capacitance and conductance–voltage characteristics of Al/Si3N4/p-Si(100) MIS diodes
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