Vertical and Smooth, etching of InP by Cl 2 /CH 4 /Ar Inductively Coupled Plasma at Room Temperature
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference12 articles.
1. Low Bias Voltage Dry Etching of InP by Inductively Coupled Plasma Using SiCl4/Ar
2. Fabrication of Two-Dimensional InP Photonic Band-Gap Crystals by Reactive Ion Etching with Inductively Coupled Plasma
3. Effect of inert gas additive species on Cl2 high density plasma etching of compound semiconductors
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