The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication-Reference-Cited by-同舟云学术

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The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication

Published:2023-11 Issue: Volume:166 Page:107700
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Zhu Yicheng^ORCID,Wang Wenjuan,Zhou Min,Qu Huidan,Li Guanhai,Chen Pingping,Lu Wei

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference28 articles.

1. The method of low-temperature ICP etching of InP/InGaAsP heterostructures in Cl2-based plasma for integrated optics applications;Ishutkin;Micromachines,2021

2. Molecular monolayers for conformal, nanoscale doping of InP nanopillar photovoltaics;Cho;Appl. Phys. Lett.,2011

3. A review of photonic systems-on-chip enabled by widely tunable lasers;Coldren;IEEE J. Quant. Electron.,2022

4. Chromatic dispersion manipulation based on metalenses;Zang;Adv. Mater.,2020

5. Metalenses at visible wavelengths: past, present, perspectives;Lalanne;Laser Photon. Rev.,2017

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