Deposition of TiN and TiAlVN thin films by DC magnetron sputtering

Author:

Abdallah Bassam,Kakhia M.,Alsadat W.

Abstract

Purpose TiN and TiAlVN films have been prepared by DC magnetron sputtering technique at room temperature. TiN target has been used to deposit TiN thin film under pure argon (100 percent Ar) gas. Additionally, Ti6Al4V alloy target has been used to deposit TiAlVN under nitrogen and argon gas (50 percent Ar and 50 percent N2). In this paper, two substrate types have been used: stainless steel 304 and Si(100). This analysis has confirmed that the nitride films, (TiN/Si) and TiAlVN in both cases, have been produced. Energy Depressive X-ray Spectroscopy (EDX) measurement confirmed that the TiN/Si was stoichiometry, where the N/Ti ratio was about 1 with low oxygen contamination. The results obtained have indicated that the TiAlVN has more resistance to corrosion than TiN film in 3.5 percent NaCl at 25°C (seawater). Both films, TiAlVN/SS304 and TiN/SS304, have shown improved corrosion resistance compared with virgin 304 substrate. Microhardness was carried out using Vickers method; the microhardness values for TiN/SS304 and TiAlVN/SS304 were approximately 7.5 GPa and 25.3 GPa, respectively. The paper aims to discuss these issues. Design/methodology/approach The films were prepared by a DC magnetron sputtering system starting from high pure (99.99 percent) Ti6Al4V target (Al 6wt%, V 4wt% and balance Ti) in plasma discharge argon/nitrogen (50 percent Ar and 50 percent N2) for deposition of TiAlVN film. Pure TiN target (99.99 percent) was used for preparation of TiN film in pure argon plasma. The diameter of target was 50 mm and the power applied for preparation of the two films was 100 W. A cylindrical high-vacuum chamber (Figure 2) made of stainless steel 316, with height 363 mm diameter, was fabricated locally. Scanning electron microscope images have been used to discover the films morphology. The composition of the films has been determined by EDX technique for films deposited on Si substrate. The electrochemical corrosion test was carried out using conventional three-electrode cell of 300 ml capacity by using Voltalab PGZ 301 system (France) using Tafel extrapolation method and electrochemical impedance spectroscopy techniques. Findings TiN and TiAlVN films have been prepared by DC magnetron sputtering technique without heating of the substrates holder. The effects of the composition of nitride films on mechanical and corrosion properties were investigated. The composition of the films has been determined by EDX technique. The effect of using titanium alloy (Ti with Al and V) on the composition and crystalline quality has been investigated. The microhardness is strongly dependent on the addition of the Al and V elements, and it consequently improves mechanical proprieties. The microhardness values for TiN/SS304 were approximately 7.5 GPa and 25.3 GPa for TiAlVN/SS304. They indicate that prepared films prevent the aggressive action of corrosion media. Originality/value TiN and TiAlVN films have been prepared by DC magnetron sputtering method at room temperature. Titanium nitride film, especially TiAlVN, is an effective method to improve the corrosion resistance of SS304. TiAlVN film has exhibited enhanced corrosion resistance and higher microhardness. Independent time-of-flight elastic recoil detection analysis has been used to determine the composition of the film.

Publisher

Emerald

Subject

Mechanical Engineering,Mechanics of Materials,Civil and Structural Engineering

Reference41 articles.

1. Physical, optical and sensing properties of sprayed zinc doped tin oxide films;Optik,2018

2. Characterization of TiAlV films prepared by vacuum arc deposition: effect of substrate temperature;Acta Physica Polonica A,2013

3. Structural, mechanical, electrical and wetting properties of ZrNx films deposited by Ar/N2 vacuum arc discharge: effect of nitrogen partial pressure;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms,2013

4. Thickness and substrate effects on AlN thin film growth at room temperature;European Physical Journal Applied Physics,2008

5. Deposition of Ti6Al4V thin films by DC magnetron sputtering: effect of the current on structural, corrosion and mechanical properties,2018

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3