A Comparison of Xenon Plasma FIB Technology with Conventional Gallium LMIS FIB: Imaging, Milling, and Gas-Assisted Applications-Reference-Cited by-同舟云学术

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A Comparison of Xenon Plasma FIB Technology with Conventional Gallium LMIS FIB: Imaging, Milling, and Gas-Assisted Applications

Published:2011-07 Issue:S2 Volume:17 Page:652-653
ISSN:1431-9276
Container-title:Microscopy and Microanalysis
language:en
Short-container-title:Microsc Microanal

Author:

Young R,Rue C,Randolph S,Chandler C,Franz G,Schampers R,Klumpp A,Kwakman L

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Publisher

Cambridge University Press (CUP)

Subject

Instrumentation

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