Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering-Reference-Cited by-同舟云学术

Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering

Published:2018-09 Issue:9 Volume:82 Page:1143-1147
ISSN:1062-8738
Container-title:Bulletin of the Russian Academy of Sciences: Physics
language:en
Short-container-title:Bull. Russ. Acad. Sci. Phys.

Author:

Boytsova E. L.,Leonova L. A.

Publisher

Allerton Press

Subject

General Physics and Astronomy

Link

http://link.springer.com/content/pdf/10.3103/S1062873818090058.pdf

Reference14 articles.

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3. Leonova, L.A., Boytsova, E.L., and Pustovalova, A.A., IOP Conf. Ser.: Mater. Sci. Eng., 2016, vol. 135, p. 012026.

4. Efimova, E.V., Leonova, L.A., and Boitsova, E.L., Abstracts of Papers, XVIII mezhdunarodnaya konferentsiya “Khimiya i khimicheskaya tekhnologiya v XXI veke” (XVIII Int. Conf. “Chemistry and Chemical Technology in the 21st Century”), Tomsk, 2017, p. 360.

5. Efimova, E.V., Abstracts of Papers, XVII mezhdunarodnaya konferentsiya “Khimiya i khimicheskaya tekhnologiya v XXI veke” (XVII Int. Conf. “Chemistry and Chemical Technology in the 21st Century”), Tomsk, 2016, p. 504.

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